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Equipment Introduction:
Chemical Vapor Deposition (CVD) refers to the method of synthesizing coatings or nanomaterials by reacting chemical gases or vapors on the surface of a substrate. It is a widely used technology in the semiconductor industry for depositing thin film materials, including a wide range of insulating materials, as well as most metal materials and metal alloy materials. For this purpose, we have developed a complete set of CVD coating systems suitable for material laboratories of universities, research institutes, environmental science, and other fields.
Equipment Introduction:
Chemical Vapor Deposition (CVD) refers to the method of synthesizing coatings or nanomaterials by reacting chemical gases or vapors on the surface of a substrate. It is a widely used technology in the semiconductor industry for depositing thin film materials, including a wide range of insulating materials, as well as most metal materials and metal alloy materials. For this purpose, we have developed a complete set of CVD coating systems suitable for material laboratories of universities, research institutes, environmental science, and other fields.
